Airocean Gases · Product Portfolio
Seven gases. Sourced at the molecular boundary of purity — enabling the processes that build microchips, insulate power grids, propel spacecraft, and image the human body.
A colorless, odorless noble gas with exceptional light-emission properties. Critical to KrF excimer laser systems operating at 248 nm — the wavelength that defines a generation of semiconductor photolithography. Also used in high-efficiency lighting and thin-film photovoltaic deposition processes.
The heaviest of the stable noble gases, xenon occupies a unique position across industries. Its brilliant white arc drives cinema projection and automotive headlamps. Its density and ionization properties make it the preferred propellant for ion thrusters in deep-space missions. In medicine, hyperpolarized Xe-129 serves as an MRI contrast agent for lung imaging; pure xenon also functions as a hemodynamically stable anesthetic.
The rarest atmospheric noble gas by extraction volume, neon is simultaneously one of the most strategically critical materials in semiconductor manufacturing. ArF and KrF excimer lasers — the workhorses of advanced node lithography — consume neon as a primary lasing medium. Beyond the fab, neon's signature 632.8 nm red-orange discharge defined twentieth-century visual culture and remains central to scientific metrology and display technology.
The coldest boiling point of any element at −268.9 °C places helium in a category of its own. Liquid helium is the sole coolant capable of maintaining the superconducting state in MRI and NMR magnets. In semiconductor manufacturing, helium purges process chambers, cools wafer stages, and serves as the gold-standard carrier gas for GC and GC-MS analytical instruments. Its molecular diameter makes it the universal standard for pressurized leak detection across aerospace and industrial applications.
One of the most powerful dielectric gases known — SF₆ is the standard insulating and arc-quenching medium in high-voltage gas-insulated switchgear (GIS), circuit breakers, and transmission substations. In semiconductor fabrication, it serves as a primary plasma etchant for silicon and silicon nitride, and as a CVD chamber-clean agent at 99.9999% electronic grade.
A colorless oxidizing gas with the broadest application range in our specialty portfolio. In healthcare, N₂O is an established analgesic and anesthetic adjunct used from dental offices to surgical suites. In semiconductor CVD, it is the primary oxidant source for silicon dioxide and silicon oxynitride gate dielectric films — available up to 99.9995% electronic grade for advanced node processes.
A thermally and chemically inert perfluorocarbon gas that generates highly reactive fluorine radicals under plasma conditions. CF₄ is a mainstay etchant for silicon, polysilicon, SiO₂, and Si₃N₄ patterning across DRAM, NAND, and advanced logic nodes, and a proven PECVD chamber-clean agent. Supplied at semiconductor grade 5.0 (99.999% min.) with moisture and oxygen controlled below 1 ppmv.
Tell us your required purity grade, cylinder pressure, volume, and delivery location. Our team responds within one business day.
Request a Quote